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arXiv 2402.12082physics.app-ph
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高达 20 keV 的 X 射线多光束叠层成像:纳米光刻技术增强 X 射线纳米成像

X-ray multibeam ptychography at up to 20 keV: nano-lithography enhances X-ray nano-imaging

Tang Li, Maik Kahnt, Thomas L. Sheppard, Runqing Yang, Ken Vidar Falch, Roman Zvagelsky, Pablo Villanueva-Perez, Martin Wegener, Mikhail Lyubomirskiy

AI总结:

本文提出并验证了在高达 20 keV 能量下使用多达 12 束平行光束的 X 射线多光束叠层成像(MBP)技术,有效突破了传统硬 X 射线叠层成像受限于相干通量的瓶颈,在不牺牲图像质量的前提下,实现了对催化剂、微芯片等复杂样品的无损、大视场、高分辨率纳米成像。

摘要:

由于硬 X 射线具有高穿透力,对固态物质内部结构的无损纳米成像仅能依靠硬 X 射线实现。最高分辨率的图像是在同步辐射源(SRF)上获得的,它提供了卓越的光谱亮度,并支持如 X 射线叠层成像(ptychography)等方法,实现个位数纳米级的分辨率。然而,分辨率或视场最终受限于可用的相干通量。为了解决这一问题,可以利用光束的非相干部分,采用多束平行光束的方法,即 X 射线多光束叠层成像(MBP)。这将 X 射线叠层成像的适用范围扩展到了更大的样品或更快速的测量。这两种优势都有利于研究复杂的复合材料或功能样品,如催化剂、能源材料或电子器件。为了在最小化光束衰减的同时提取对扩展样品的全部优势,必须克服在高能量和许多平行光束下进行叠层成像的挑战。在此,我们报告了使用多达 12 束光子能量为 13 和 20 keV 的光束进行 MBP 的应用。我们展示了其在多种样品上的性能:西门子星测试图案、多孔 Ni/Al2O3 催化剂、微芯片和金纳米晶体簇,在不牺牲图像质量的情况下,超越了传统硬 X 射线叠层成像的测量极限。

英文摘要:

Non-destructive nano-imaging of the internal structure of solid matter is only feasible using hard X-rays due to their high penetration. The highest resolution images are achieved at synchrotron radiation sources (SRF), offering superior spectral brightness and enabling methods such as X-ray ptychography delivering single-digit nm resolution. However the resolution or field of view is ultimately constrained by the available coherent flux. To address this, the beam's incoherent fraction can be exploited using multiple parallel beams in an approach known as X-ray multibeam ptychography (MBP). This expands the domain of X-ray ptychography to larger samples or more rapid measurements. Both qualities favor the study of complex composite or functional samples, such as catalysts, energy materials, or electronic devices. The challenges of performing ptychography at high energy and with many parallel beams must be overcome to extract the full advantages for extended samples while minimizing beam attenuation. Here, we report the application of MBP with up to 12 beams and at photon energies of 13 and 20 keV. We demonstrate performance for various samples: a Siemens star test pattern, a porous Ni/\ce{Al2O3} catalyst, a microchip, and gold nano-crystal clusters, exceeding the measurement limits of conventional hard X-ray ptychography without compromising image quality.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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