通过原子氢还原合成薄膜无限层镍酸盐：阐明覆盖层的作用
Synthesis of thin film infinite-layer nickelates by atomic hydrogen reduction: clarifying the role of the capping layer
AI总结：
本文提出利用分子束外延结合原子氢还原合成无限层镍酸盐薄膜的集成工艺，发现所得薄膜结构优异且电阻率更低，并揭示了SrTiO3覆盖层在防止表面二次相形成中的关键作用。
摘要：
我们提出了一种利用分子束外延结合原子氢气相还原来合成无限层镍酸盐的集成工艺。我们首先讨论了钙钛矿NdNiO$_3$/SrTiO$_3$在生长和表征中面临的挑战，这些挑战源于化学计量比薄膜在生长后产生的裂纹。随后，我们详细介绍了使用原子氢将NdNiO$_3$薄膜完全还原为无限层相NdNiO$_2$的工艺；所得薄膜展现出优异的结构质量、光滑的表面，且残余电阻率低于其他方法还原的薄膜。我们利用该技术的原位特性研究了SrTiO$_3$覆盖层在还原过程中的作用，阐明了其在防止暴露的镍酸盐表面形成二次相方面的重要性。一项体敏感与表面敏感的对比研究表明，薄膜表面形成的多晶外壳限制了还原过程。
英文摘要：
We present an integrated procedure for the synthesis of infinite-layer nickelates using molecular-beam epitaxy with gas-phase reduction by atomic hydrogen. We first discuss challenges in the growth and characterization of perovskite NdNiO$_3$/SrTiO$_3$, arising from post growth crack formation in stoichiometric films. We then detail a procedure for fully reducing NdNiO$_3$ films to the infinite-layer phase, NdNiO$_2$, using atomic hydrogen; the resulting films display excellent structural quality, smooth surfaces, and lower residual resistivities than films reduced by other methods. We utilize the in situ nature of this technique to investigate of the role that SrTiO$_3$ capping layers play in the reduction process, illustrating their importance in preventing the formation of secondary phases at the exposed nickelate surface. A comparative bulk- and surface-sensitive study indicates formation of a polycrystalline crust on the film surface serves to limit the reduction process.
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