面向半导体制造技术的带Halbach阵列直线电机的建模与设计优化
Modeling and Design Optimization of a Linear Motor with Halbach Array for Semiconductor Manufacturing Technology
AI总结：
本研究针对半导体光刻用高加速低振动Halbach阵列无槽双侧直线电机，提出融合安培电流与磁荷模型的混合解析建模方法，将求解简化为拉普拉斯方程，推导多类性能量并经FEM验证，还完成了模型对比与直线平台的设计优化及灵敏度分析。
摘要：
本文针对半导体制造技术中光刻机所用的、搭载任意Halbach阵列的高加速度、低振动无槽双侧直线电机，开展了解析建模与设计研究。研究将永磁体的安培电流模型与磁荷模型融合，采用混合方法构建了全面的解析模型。与将磁体视为泊松方程源项的传统方法不同，本方法将求解简化为拉普拉斯方程，磁体则以边界条件的形式表征。研究推导了不同区域内的磁场与磁势，以及剪切应力、力-角特性、转矩曲线、吸引力、失准力、反电动势等电机性能量，并进行了综合分析，还与有限元法（FEM）结果对比以验证精度。此外，研究还推导、对比并分析了两种分别基于标量势和矢量势的泊松方程模型。最后，本文探讨了面向光刻应用的直线平台的设计优化与灵敏度分析。
英文摘要：
This paper presents analytical modeling and design of a high-acceleration, low-vibration slotless double-sided linear motor with an arbitrary Halbach array for lithography machines used in semiconductor manufacturing technology. Amperian current and magnetic charge models of permanent magnets are integrated into a hybrid approach to develop comprehensive analytical modeling. Unlike conventional methods that treat magnets as sources for Poisson's equations, the solution is reduced to Laplace's equations, with magnets being represented as boundary conditions. The magnetic fields and potentials within distinct regions, along with machine quantities such as shear stress, force-angle characteristics, torque profile, attraction force, misalignment force, and back-EMF, are derived, comprehensively analyzed, and compared to FEM results for accuracy validation. In addition, two models based on Poisson's equations in terms of scalar and vector potentials are derived, compared, and analyzed. Finally, design optimization and sensitivity analysis of a linear stage for lithography applications are discussed.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
