利用电化学发光筛选薄膜功能层中的导电缺陷
Screening for electrically conductive defects in thin functional films using electrochemiluminescence
AI总结：
本文提出一种基于鲁米诺电化学发光的高通量方法，用于检测绝缘薄膜中的亚微米导电缺陷，最小可检测线条宽2.5纳米、针孔半径35纳米，并用于苯酚膜表征，助力多功能薄膜自动化发现。
摘要：
能源相关器件中的多功能薄膜通常必须具有电绝缘性，而单个纳米级缺陷就可能导致整个器件规模的失效。定位和表征此类缺陷是一个基本问题，需要高分辨率成像方法来发现缺陷，但高空间分辨率成像会限制视场，从而降低测量通量。在此，我们提出了一种新颖的高通量方法，通过利用鲁米诺的电化学发光（ECL）来检测绝缘薄膜中的亚微米缺陷。通过对试剂浓度、缓冲液、电压和激发时间的系统研究，我们确定了优化条件，在这些条件下可以检测到面积约为相机单个像素所探测面积500倍的微小特征，实现了亚微米缺陷的高通量检测。特别是，我们估计可检测的最小特征为宽度窄至2.5纳米的线条和半径小至35纳米的针孔。我们进一步探索了该方法，将其用于表征名义上绝缘的苯酚薄膜，发现导电缺陷，并与高分辨率原子力显微镜进行交叉关联，为合成提供反馈。鉴于该测定固有的并行性和可扩展性，预计它将对手多功能薄膜的自动化发现产生重大影响。
英文摘要：
Multifunctional thin films in energy-related devices often must be electrically insulating where a single nanoscale defect can result in complete device-scale failure. Locating and characterizing such defects presents a fundamental problem where high-resolution imaging methods are needed to find defects, but imaging with high spatial resolution limits the field of view and thus the measurement throughput. Here, we present a novel high-throughput method for detecting sub-micron defects in insulating thin films by leveraging the electrochemiluminescence (ECL) of luminol. Through a systematic study of reagent concentrations, buffers, voltage, and excitation time, we identify optimized conditions at which it is possible to detect features with areas ~500 times smaller than the area interrogated by a single pixel of the camera, showing high-throughput detection of sub-micron defects. In particular, we estimate the minimum detectable features to be lines as narrow as 2.5 nm in width and pinholes as small as 35 nm in radius. We further explore this method by using it to characterize a nominally insulating phenol film and find conductive defects that are cross-correlated with high-resolution atomic force microscopy to provide feedback to synthesis. Given the inherent parallelizability and scalability of this assay, it is expected to have a major impact on the automated discovery of multifunctional films.
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