低密度多孔物质部分均匀化等离子体的状态方程
The equation of state of a partly homogenized plasma of low-dense porous matter
AI总结：
本文提出含均匀化程度的低密度多孔物质等离子体状态方程，通过近似解析解与数值计算分析平面层热膨胀，并用于验证激光和X射线脉冲加热实验数据。
摘要：
本文提出了一种低密度多孔物质等离子体的状态方程（EOS），其形式为连续介质EOS，其中包含作为压力控制参数的等离子体均匀化程度，该程度是初始多孔结构以及当前等离子体密度和温度值的函数。利用部分均匀化等离子体EOS，求得了近似解析解，并对多孔物质平面层热膨胀问题进行了数值计算。讨论了所得结果的特点，并与等效化学成分的连续物质情况进行了比较。所提出的状态方程被用于分析激光和X射线脉冲加热多孔物质的实验数据。
英文摘要：
The equation of state (EOS) of a low-density porous substance plasma is proposed in the form of continuous media EOS containing, as a pressure control parameter, the degree of plasma homogenization, which is function of the initial porous structure, as well as of the current values of plasma density and temperature. Using the partially-homogenized-plasma EOS an approximate analytical solution is found and numerical calculations were performed of the problem of thermal expansion of a flat layer of porous matter. The features of the obtained results are discussed in comparison with the case of a continuous substance of equivalent chemical composition. The proposed equation of state is used to analyze the experimental data on porous substance heating with laser and X-ray pulses.
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