用统一调制模式分析（UMPA）模型高速处理X射线波前标记数据
High-speed processing of X-ray wavefront marking data with the Unified Modulated Pattern Analysis (UMPA) model
摘要：
波前标记X射线成像技术使用例如，用砂纸或光栅产生强度波动，并分析它们因样品而产生的畸变，以便恢复衰减、相衬和暗场信息。相衬产生一个改进的可见性的软组织标本，而暗场揭示了小角度散射从亚分辨率结构。两者都有许多生物医学和工程应用。以前开发的统一调制模式分析（UMPA）模型提取这些模式的波前标记数据。我们在这里提出了一个新的UMPA实现，能够快速处理大型数据集，并具有极大地扩展视野的功能。我们还讨论了可能的工件和额外的新功能。
英文摘要：
Wavefront-marking X-ray imaging techniques use e.g., sandpaper or a grating to generate intensity fluctuations, and analyze their distortion by the sample in order to retrieve attenuation, phase-contrast, and dark-field information. Phase contrast yields an improved visibility of soft-tissue specimens, while dark-field reveals small-angle scatter from sub-resolution structures. Both have found many biomedical and engineering applications. The previously developed Unified Modulated Pattern Analysis (UMPA) model extracts these modalities from wavefront-marking data. We here present a new UMPA implementation, capable of rapidly processing large datasets and featuring capabilities to greatly extend the field of view. We also discuss possible artifacts and additional new features.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
