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arXiv 2210.03498physics.app-phcond-mat.mtrl-sci

化学气相沉积生长参数对单层MoS₂光学性质的全球和局部影响

Effects of CVD Growth Parameters on Global and Local Optical Properties of MoS$_2$ Monolayers

A. Senkić, J. Bajo, A. Supina, B. Radatović, N. Vujičić

AI总结:

本研究通过分析CVD生长参数对单层MoS₂光学性质的影响,揭示了硫浓度对晶体形态和光学响应的关键作用,为可控合成二维TMDs及其合金提供了新的方法路径。

摘要:

半导体过渡金属二硫化物(TMDs)结合了强光-物质相互作用、良好的化学稳定性和可扩展的制造技术,因此在光电子、光电和光收集应用中具有良好的前景。可控地制造高质量TMD单层并具有低缺陷含量仍然具有挑战性,阻碍了其在技术应用中的采用。化学气相沉积(CVD)生长的单层MoS₂的光学性质在CVD过程中受硫化钼(Mo)前驱体的配比影响较大。在此,我们研究了硫浓度如何影响样品形态以及其全局和局部的光学响应。我们确认,在Mo:S > 1:2的配比下,样品具有规则的形态,这得益于适度的三角单晶覆盖,具有优异的光学响应。我们的数据驱动方法将生长条件与晶体形态及其光学响应相关联,提供了一条实用且必要的途径,以解决向受控合成具有所需光学和电子性质的2D TMDs及其合金的挑战。

英文摘要:

Semiconducting transition metal dichalcogenides (TMDs) combine strong light-matter interaction with good chemical stability and scalable fabrication techniques, and are thus excellent prospects for optoelectronic, photonic and light-harvesting applications. Controllable fabrication of high-quality TMD monolayers with low defect content is still challenging and hinders their adoption for technological application. The optical properties of chemical vapor deposition (CVD) grown monolayer MoS$_2$ are largely influenced by the stoichiometry during CVD by controlled sulfurization of molybdenum (Mo) precursors. Here, we investigate how the sulfur concentration influences the sample morphology and, both globally and locally, their optical response. We confirm that samples grown under a Mo:S > 1:2 stoichiometric ratio have regular morphology facilitated by a moderate coverage of triangular monocrystals with excellent optical response. Our data-driven approach correlates growth conditions with crystal morphology and its optical response, providing a practical and necessary pathway to address the challenges towards the controlled synthesis of 2D TMDs and their alloys with desired optical and electronic properties.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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