用非微扰三次和五次谐波探测硅表面和硅-硅界面
Probing the surface of silicon and the silicon-silica interface using nonperturbative third and fifth harmonic generation
摘要：
我们研究，在向后（反射）的几何形状，第三和第五次谐波的产生，位于深和真空紫外线，在硅的表面上和硅和二氧化硅之间的界面上，当一个薄的二氧化硅膜生长在硅衬底上。在这两种情况下，谐波信号的驱动激光束的偏振方向上的强烈依赖性被发现。观察到的差异为两个样品，定性地解释。此外，一个简化的张量形式主义的偏振依赖，它揭示了结构的对称性的表面和界面，并描述了偏振依赖与高精度。该研究是进一步理解材料边界上的非线性相互作用和非微扰谐波产生的必要步骤。
英文摘要：
We examined, in backward (reflection) geometry, the generation of the 3rd and 5th harmonics, located in the deep and vacuum ultraviolet, on the surface of silicon and on the interface between silicon and silica when a thin silica film was grown on a silicon substrate. In both cases, a strong dependence of the harmonic signal on the polarization direction of the driving laser beam was found. The differences observed for both samples, are qualitatively explained. Furthermore, a simplified tensor formalism for the polarization dependence is introduced, which reveals the structural symmetry of the surface and the interface and describes the polarization dependence with high accuracy. The study is an essential step to further understand nonlinear interaction and nonperturbative harmonic generation on the boundaries of materials.
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