磨损试验过程中多孔MoS2涂层的结构重新取向和压实
Structural reorientation and compaction of porous MoS2 coatings during wear testing
摘要：
工业升级经常导致与文献中提出的实验室原型不同的涂层微观结构。在这里，我们研究了物理气相沉积（PVD）MoS2涂层的磨损行为：致密的纳米晶MoS2涂层和多孔的棱柱形织构MoS2涂层。磨损试验前后的透射电子显微镜（TEM）研究表明，两个样品中均出现了朝向基底织构的晶体学重新取向。由于其低摩擦性能，基底纹理通常是理想的。这种有利的重新取向与多孔试样的摩擦学压实有关。在磨合之后，在高接触压力下的滑动最终导致与通过化学气相沉积（CVD）生长的理想生长块状MoS2单晶一样小的磨损率。这表明工业级MoS2涂层的缺陷可以通过合适的预处理来补救。
英文摘要：
Industrial upscaling frequently results in a different coating microstructure than the laboratory prototypes presented in the literature. Here, we investigate the wear behavior of physical vapor deposited (PVD) MoS2 coatings: A dense, nanocrystalline MoS2 coating, and a porous, prismatic-textured MoS2 coating. Transmission electron microscopy (TEM) investigations before and after wear testing evidence a crystallographic reorientation towards a basal texture in both samples. A basal texture is usually desirable due to its low-friction properties. This favorable reorientation is associated to a tribological compaction of the porous specimens. Following running-in, sliding under high contact pressure ultimately leads to a wear rate as small as for an ideal grown bulk MoS2 single crystal grown by chemical vapor deposition (CVD). This suggests that the imperfections of industrial grade MoS2 coatings can be remediated by a suitable pretreatment.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
