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arXiv 2202.04458physics.ins-det
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溅射非晶态SiC涂层力学和光学性能的测量与模拟

Measurement and simulation of mechanical and optical properties of sputtered amorphous SiC coatings

G. Favaro, A. Amato, F. Arciprete, M. Bazzan, E. Cesarini, F. De Matteis, T. H. Dao, M. Granata, C. Honrado-Benítez, N. Gutiérrez-Luna, J. I. Larruquert, G. Lor… 展开作者

G. Favaro, A. Amato, F. Arciprete, M. Bazzan, E. Cesarini, F. De Matteis, T. H. Dao, M. Granata, C. Honrado-Benítez, N. Gutiérrez-Luna, J. I. Larruquert, G. Lorenzin, D. Lumaca, G. Maggioni, M. Magnozzi, E. Placidi, P. Prosposito, F. Puosi

摘要:

在这项工作中,我们报告了广泛的表征非晶碳化硅(a-SiC)涂层制备的物理沉积方法。我们比较了两种不同的溅射系统(标准RF磁控溅射和离子束辅助溅射)上获得的结果,以抓住两种不同的设置对结果的可重复性的影响。在对所制备样品的结构、形态和组成特征进行彻底表征后,我们重点研究了这些材料的光学和机械损耗。从微观的角度来看,通过比较我们的实验结果与分子动力学模拟的非晶SiC结构的机械损失进一步研究:首先,我们定义了一个协议,以产生一个数值模型的非晶薄膜,捕捉的主要功能的真实系统,然后我们模拟其动态行为变形后,以获得其机械响应。我们的研究结果进行了讨论的应用前景的a-SiC作为一种光学材料的高精度光学实验,特别是在引力波干涉。

英文摘要:

In this work We report on the extensive characterization of amorphous silicon carbide (a-SiC) coatings prepared by physical deposition methods. We compare the results obtained on two different sputtering systems (a standard RF magnetron sputtering and a ion-beam assisted sputtering) to seize the impact of two different setups on the repeatably of the results. After a thorough characterization of structural, morphological, and compositional characteristics of the prepared samples, we focus on a detailed study of the optical and mechanical losses in those materials. Mechanical losses are further investigated from a microscopic point of view by comparing our experimental results with molecular dynamic simulations of the amorphous SiC structure: first we define a protocol to generate a numerical model of the amorphous film, capturing the main features of the real system; then we simulate its dynamical behaviour upon deformation in order to obtain its mechanical response. Our results are discussed within the perspective application of a-SiC as an optical material for high-precision optical experiments and in particular in gravitational wave interferometry.

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