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arXiv 2202.01964physics.opticsphysics.app-ph
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硅中laser损伤过程的三温模拟

Three-temperature modeling of laser-induced damage process in silicon

Prachi Venkat, Tomohito Otobe

摘要:

研究了硅中飞秒到皮秒时间尺度的激光激发。我们假设三温度模型(3 TM),它描述了不同的准温度的动态电子,空穴和晶格。损伤阈值的数值结果再现实验结果不仅定量,但定性以及,显示依赖于激光脉冲宽度。与实验数据的比较表明,电子发射和热熔化都是造成硅损伤的原因。我们发现电子-声子弛豫时间对电子发射的脉冲宽度依赖性有显著的影响。

英文摘要:

Laser excitation in silicon from femto- to pico-second time scales is studied. We assume the Three-Temperature Model (3TM) which describes the dynamics of the distinct quasi-temperatures for electrons, holes, and lattice. Numerical results for damage threshold reproduce the experimental results not only quantitatively, but qualitatively as well, showing dependence on laser pulse duration. Comparison with experimental data suggests that electron emission and thermal melting are both responsible for damage in silicon. We found that electron-phonon relaxation time has a significant effect on pulse duration dependence of electron emission.

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