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arXiv 2201.03671cond-mat.mes-hall
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磁随机存取存储器自旋电流电产生的研究进展

A Perspective on Electrical Generation of Spin Current for Magnetic Random Access Memories

Christopher Safranski, Jonathan Z. Sun, Andrew D. Kent

摘要:

自旋电流用于通过切换磁性隧道结(MTJ)纳米柱的铁磁电极中的一个的磁化方向来在磁性随机存取存储器(MRAM)装置中写入信息。充电电流到自旋电流的转换的不同物理机制可用于2端子和3端子装置几何形状中。在2端器件中,电荷-自旋转换通过MTJ的铁磁电极中的自旋过滤而发生,并且目前的MRAM器件在理论上预期的最大电荷-自旋转换效率附近操作。在3-端子器件中,沟道材料中的自旋-轨道相互作用也可以用于产生大的自旋电流。在这篇透视文章中,我们讨论了可以满足MRAM技术要求的电荷-自旋转换过程。我们强调需要开发具有更大的电荷-自旋转换效率的沟道材料-可以等于或超过自旋过滤产生的-和自旋极化分量垂直于沟道界面的自旋电流。这将实现基于亚20 nm直径垂直磁化MTJ纳米柱的高性能器件,而不需要对称破缺场。我们还讨论了CMOS集成所必需的MRAM特性。最后,我们确定关键的研究需要的电荷到自旋转换测量和指标,可用于优化器件沟道材料和界面特性之前,全MTJ纳米柱器件的制造和表征。

英文摘要:

Spin currents are used to write information in magnetic random access memory (MRAM) devices by switching the magnetization direction of one of the ferromagnetic electrodes of a magnetic tunnel junction (MTJ) nanopillar. Different physical mechanisms of conversion of charge current to spin current can be used in 2-terminal and 3-terminal device geometries. In 2-terminal devices, charge-to-spin conversion occurs by spin filtering in the MTJ's ferromagnetic electrodes and present day MRAM devices operate near the theoretically expected maximum charge-to-spin conversion efficiency. In 3-terminal devices, spin-orbit interactions in a channel material can also be used to generate large spin currents. In this perspective article, we discuss charge-to-spin conversion processes that can satisfy the requirements of MRAM technology. We emphasize the need to develop channel materials with larger charge-to-spin conversion efficiency -- that can equal or exceed that produced by spin filtering -- and spin currents with a spin polarization component perpendicular to the channel interface. This would enable high-performance devices based on sub-20 nm diameter perpendicularly magnetized MTJ nanopillars without need of a symmetry breaking field. We also discuss MRAM characteristics essential for CMOS integration. Finally, we identify critical research needs for charge-to-spin conversion measurements and metrics that can be used to optimize device channel materials and interface properties prior to full MTJ nanopillar device fabrication and characterization.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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