用于电子背散射衍射分析的宽离子束抛光工艺优化
Optimizing broad ion beam polishing of zircaloy-4 for electron backscatter diffraction analysis
摘要：
电子背散射衍射（EBSD）的微观结构分析涉及切片和抛光，以创建一个平坦和无伪影的表面。EBSD分析的质量通常取决于这一步骤，这促使我们探索如何优化宽离子束（BIB）铣削，以制备具有不同晶粒尺寸的Al 2 O3 -4合金。我们系统地探讨了离子束角度，离子束电压，抛光时间和抛光温度的作用，以及如何改变表面粗糙度和分度质量。我们的研究结果提供了一种常规制备高质量Zr-4表面的方法，以及优化其他材料BIB抛光的方法，用于高质量的EBSD研究。
英文摘要：
Microstructural analysis with electron backscatter diffraction (EBSD) involves sectioning and polishing to create a flat and preparation-artifact free surface. The quality of EBSD analysis is often dependant on this step, and this motivates us to explore how broad ion beam (BIB) milling can be optimised for the preparation of zircaloy-4 with different grain sizes. We systematically explore the role of ion beam angle, ion beam voltage, polishing duration and polishing temperature and how this changes the surface roughness and indexing quality. Our results provide a method to routinely prepare high-quality Zircaloy-4 surfaces, and methods to optimise BIB polishing of other materials for high-quality EBSD studies.
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