FFP3口罩的冷大气等离子体灭菌和长期材料效应
Cold Atmospheric Plasma Sterilization of FFP3 Face Masks and Long-Term Material Effects
摘要：
利用冷大气等离子体（CAP）对敏感表面进行消毒是应用等离子体物理的一个有趣的新领域。受冠状病毒大流行初期口罩和安全服短缺的影响，我们对带有CAP的FF 3口罩的灭菌及其材料效应进行了研究。因此，用测试菌大肠杆菌（E. coli）对FFP 3口罩材料进行CAP余辉灭菌，研究其对织物样品的杀菌和杀孢子效果。coli）和萎缩芽孢杆菌（Bacillus atrophaeus，B.萎缩）和随后在表面微放电（SMD）等离子体装置中的CAP余辉处理。此外，在长期等离子体处理（15小时）的口罩材料和它的单个组件-乙烯醋酸乙烯酯（EVA）和聚丙烯（PP）的变化进行了详细的分析，使用表面分析方法，如激光显微镜，接触角测量，X射线光电子能谱学（XPS）以及织物的渗透性和电阻测量。实验表明，E.杆菌和枯草在氮气模式下（12 kVpp，5 kHz），等离子体处理能有效灭活萎缩期细胞。为了B 30分钟后达到超过4-log的萎缩灭活。E.在CAP处理的1分钟内，大肠杆菌群体可以减少5-log，并且在5分钟后实现完全失活（> 6-log）。材料分析表明，长时间（> 5 h）的等离子体处理会影响织物的静电性能。由此可以推断，用SMD装置的CAP余辉对FFP 3面罩进行等离子体处理可以有效地灭活织物上的微生物。FFP 3口罩可以进行等离子体净化并多次重复使用，但仅在有限的范围内，否则渗透率水平不再符合DIN EN 149规范。
英文摘要：
The use of cold atmospheric plasmas (CAP) to sterilize sensitive surfaces is an interesting new field of applied plasma physics. Motivated by the shortages of face masks and safety clothing at the beginning of the corona pandemic, we conducted studies on the sterilization of FF3 face masks with CAP and the resulting material effects. Therefore, the bactericidal and sporicidal efficacy of CAP afterglow sterilization of FFP3 mask material was investigated by inoculating fabric samples with test germs Escherichia coli (E. coli) and Bacillus atrophaeus (B. atrophaeus) and subsequent CAP afterglow treatment in a surface-micro-discharge (SMD) plasma device. In addition, a detailed analysis of the changes in long-term plasma treated (15h) mask material and its individual components - ethylene vinyl acetate (EVA) and polypropylene (PP) - was carried out using surface analysis methods such as laser microscopy, contact angle measurements, X-ray photoelectron spectroscopy (XPS) as well as fabric permeability and resistance measurements. The experiments showed that E. coli and B. atrophaeus could both be effectively inactivated by plasma treatment in nitrogen mode (12 kVpp, 5 kHz). For B. atrophaeus inactivation of more than 4-log was achieved after 30 minutes. E. coli population could be reduced by 5-log within one minute of CAP treatment and after five minutes a complete inactivation (> 6-log) was achieved. Material analysis showed that long-term (> 5 h) plasma treatment affects the electrostatic properties of the fabric. From this it can be deduced that the plasma treatment of FFP3 face masks with the CAP afterglow of an SMD device effectively inactivates microorganisms on the fabric. FFP3 masks can be plasma decontaminated and reused multiple times but only to a limited extent, as otherwise the permeability levels no longer meet the DIN EN 149 specifications.
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