用于电阻板室气体混合物的四氟丙烯HFO1234ze(E)中的电子碰撞截面
Electron Collision Cross Sections in Tetrafluoropropene HFO1234ze(E) for Gas Mixtures in Resistive Plate Chambers
AI总结：
本研究针对低全球变暖潜势的新型RPCs替代气体HFO1234ze(E)，推导其电子散射截面集，验证后计算了相关气体混合物的临界电场强度与有效电离汤森系数，为RPCs气体混合物优化提供支撑。
摘要：
近年来，四氟丙烯HFO1234ze(E)（C₃H₂F₄）在电阻板室（RPCs）领域受到越来越多的关注。这种新型气体全球变暖潜势低，被认为是目前RPCs中使用的标准混合物的有前景的替代品。掌握C₃H₂F₄中的电子碰撞截面知识，能够可靠预测基于C₃H₂F₄的气体混合物中的电子输运系数和反应速率，从而可以优化这类气体混合物，使其在RPCs中达到预期性能。\n 研究通过测量电子输运系数和反应速率，推导得到了C₃H₂F₄中电子的一整套散射截面。研究通过将电子群参数与纯C₃H₂F₄及C₃H₂F₄/CO₂气体混合物中的实验数据进行系统比较，完成了对电子碰撞截面的验证。考虑到C₃H₂F₄中电子附着受气体密度的影响，本工作还精确计算了此类混合物中的临界电场强度。这套截面还被进一步用于计算含C₃H₂F₄的气体混合物中的有效电离汤森系数，该系数有望应用于RPCs中。
英文摘要：
In recent years, there has been growing interest in tetrafluoropropene HFO1234ze(E) (C$_{3}$H$_{2}$F$_{4}$) for Resistive Plate Chambers (RPCs). This novel gas is considered a promising alternative to the standard mixtures currently used in RPCs, thanks to its low global warming potential. The knowledge of electron collision cross sections in C$_{3}$H$_{2}$F$_{4}$ enables reliable predictions of electron transport coefficients and reaction rates in C$_{3}$H$_{2}$F$_{4}$-based gas mixtures. This allows for optimizing the C$_{3}$H$_{2}$F$_{4}$-based gas mixtures to achieve the desired performance in RPCs. From measurements of electron transport coefficients and reaction rates, a complete set of scattering cross sections for electrons in C$_{3}$H$_{2}$F$_{4}$ has been derived. Validation of the electron collision cross sections is achieved through systematic comparisons of electron swarm parameters with experimental data in both pure C$_{3}$H$_{2}$F$_{4}$ and C$_{3}$H$_{2}$F$_{4}$/CO$_{2}$ gas mixtures. Given the influence of electron attachment in C$_{3}$H$_{2}$F$_{4}$ by the gas density, this work also includes precise calculations of the critical electric field strength in such mixtures. This set of cross sections has been further utilized to compute the effective ionization Townsend coefficient in gas mixtures containing C$_{3}$H$_{2}$F$_{4}$, potentially applicable for RPCs.
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