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arXiv 2102.08799cond-mat.supr-concond-mat.str-el
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Ca2CuO2Cl2莫特绝缘体中空穴对诱导的原子尺度电子态成像

Imaging the atomic-scale electronic states induced by a pair of hole dopants in Ca2CuO2Cl2 Mott insulator

Haiwei Li, Shusen Ye, Jianfa Zhao, Changqing Jin, Yayu Wang

摘要:

我们使用扫描隧道显微镜观察原子尺度的电子态诱导的一对空穴掺杂剂在Ca 2 CuO 2 Cl 2母体莫特绝缘体的铜酸盐。我们发现当两种掺杂剂相互靠近时,光谱权重从高能Hubbard带向低能隙内态的转移在费米能级附近产生了一个宽峰和近V形带隙。峰值位置在4a0附近突然下降,然后几乎保持不变。的间隙状态表现出特有的空间分布取决于配置的两种掺杂剂相对于底层的铜晶格。这些结果为低能电子态的演化提供了新的思路。

英文摘要:

We use scanning tunneling microscopy to visualize the atomic-scale electronic states induced by a pair of hole dopants in Ca2CuO2Cl2 parent Mott insulator of cuprates. We find that when the two dopants approach each other, the transfer of spectral weight from high energy Hubbard band to low energy in-gap state creates a broad peak and nearly V-shaped gap around the Fermi level. The peak position shows a sudden drop at distance around 4 a0 and then remains almost constant. The in-gap states exhibit peculiar spatial distributions depending on the configuration of the two dopants relative to the underlying Cu lattice. These results shed important new lights on the evolution of low energy electronic states when a few holes are doped into parent cuprates.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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