Ion-assisted surface processes are the basis of modern plasma processing. Ion energy distribution (IED) control is critical for precise material modification, especially in atomic-level technologies such as atomic layer etching. Since this control should be done in real time, it requires real-time feedback using fast process sensors. In the general case of an industrial plasma reactor, when direct IED measurement is not possible, the IED can be estimated using the concept of a virtual IED sensor. In this paper, a similar virtual IED sensor is considered using an asymmetric dual-frequency (df) rf CCP discharge as an example. It is based on a fast calculation method of the IED at an rf-biased electrode. This approach uses the experimentally measured sheath voltage waveform and plasma density (or ion flux) as input data, and also includes Monte-Carlo simulation of ion motion in the sheath to take into account the effect of ion-neutral collisions. To validate this approach, experiments were carried out using various plasma diagnostics in several gases: argon and xenon as examples of plasma with atomic ions and nitrogen as an example of plasma with molecular ions. It is shown that in all cases it is possible to obtain an adequate IED estimation, close to the experimental one, in a reasonably short time (~ tens of seconds when using a modern PC). The results obtained demonstrate the possibility of using a virtual IED sensor in real plasma processing.
Revisiting Electron Heating in Capacitively Coupled Plasma (CCP) Discharges: A Nonlinear Dynamics Perspective
Institute for Plasma Research（等离子体研究所）；Homi Bhabha National Institute（霍米·巴巴国立研究所）；School of Physical Sciences, UM-DAE Centre for Excellence in Basic Sciences, University of Mumbai（孟买大学物理科学学院，UM-DAE基础科学卓越中心）
Simulation Studies of Resonant Excitation of Electron Bernstein Waves in Capacitive Discharges
School of Physical Sciences, UM-DAE Centre for Excellence in Basic Sciences, University of Mumbai（孟买大学基础科学卓越中心物理学院）；Institute for Plasma Research（等离子体研究所）；Homi Bhabha National Institute（霍米·巴巴国立研究所）；Princeton Plasma Physics Laboratory（普林斯顿等离子体物理实验室）
Resonantly Driven Electron Bernstein Waves in Magnetized Low-Pressure Capacitive Discharges
School of Physical Sciences, UM-DAE Centre for Excellence in Basic Sciences, University of Mumbai（孟买大学物理科学学院，UM-DAE基础科学卓越中心）；Institute for Plasma Research（等离子体研究所）；Homi Bhabha National Institute（霍米·巴哈国家研究所）；Princeton Plasma Physics Laboratory（普林斯顿等离子体物理实验室）
Investigating the effects of electron bounce-cyclotron resonance on plasma dynamics in capacitive discharges operated in the presence of a weak transverse magnetic field
High frequency sheath modulation and higher harmonic generation in a low pressure very high frequency capacitively coupled plasma excited by sawtooth waveform
Direct experimental measurement of ion properties in extreme plasma condition
University of Nevada Reno（内华达大学雷诺分校）；Indian Institute of Technology Delhi（德里印度理工学院）；Indian Institute of Science Education and Research（印度科学教育与研究学院）；Joint Institute for High Temperatures, Russian Academy of Sciences（俄罗斯科学院高温联合研究所）
