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arXiv 2011.07884physics.plasm-phphysics.app-ph
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Double electric layer influence on dynamic of EUV radiation from plasma of high-current pulse diode in tin vapor

I. V. Borgun, N. A. Azarenkov, A. Hassanein, A. F. Tseluyko, V. I. Maslov, D. L. Ryabchikov

英文摘要:

Generation of high-power pulses of extreme ultraviolet radiation from multi-charged tin plasma are of great interest to many applications. We studied the electric potential distribution in the discharge gap in kind formed double layer. The local plasma heating by electron beam, formed in the double layer, leads to generation of peak radiation pulses and as a result to an increase in the radiation power.

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