介电辅助加速结构中类金刚石涂层对微电子倍增效应的抑制
Multipactor suppression in dielectric-assist accelerating structures via diamond-like carbon coatings
摘要：
在加速器领域中，次级电子倍增器放电被广泛观察到，并且已经研究了其抑制以改善加速器性能。介质辅助加速（DAA）腔是一种驻波加速腔，通过利用介质层的反射在室温下获得超过100，000的Q值; DAA腔预计将与小RF功率源和高负载操作一起使用。到目前为止，DAA腔的最大加速场已被限制在几MV/m的倍增管。通过在DAA腔表面涂敷类金刚石膜（DLC）来降低次级电子发射系数，同时又不牺牲腔的Q值，我们证明了$6~[{\rm μs}]$射频脉冲可以注入到DAA腔中，并具有大于10 MV/m的场，同时抑制了DAA腔的二次电子倍增。
英文摘要：
Multipactor discharges are widely observed in the accelerator field, and their suppression has been studied to improve accelerator performance. A dielectric-assist accelerating (DAA) cavity is a standing-wave accelerating cavity that attains a Q-value of over 100,000 at room temperature by using the reflection of the dielectric layer; the DAA cavity is expected to be used with a small RF power source and high-duty operation. Thus far, the maximum accelerating field of DAA cavities has been limited to a few MV/m by the multipactor. By applying a diamond-like carbon (DLC) coating to reduce the secondary electron emission coefficient without sacrificing the Q-value of the cavity, we have demonstrated that a $6~[{\rm μs}]$ RF pulse can be injected into a DAA cavity with a field of more than 10~[MV/m] while suppressing the multipactor.
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