微结构对外延CaRuO $_3$薄膜电子输运性质的影响
Effect of microstructure on the electronic transport properties of epitaxial CaRuO$_3$ thin films
摘要：
我们进行了广泛的比较研究的结构和运输性能的CaRuO $_3$薄膜在不同的氧气压力下生长。我们发现，薄膜的择优取向和表面粗糙度的强烈影响，在生长过程中的氧分压。这反过来又会影响薄膜的电磁性能。在高氧气压力下生长的薄膜具有最小的表面粗糙度，并显示出良好的金属的传输特性下降到最低温度测量。另一方面，在低氧气压力下生长的薄膜具有高度的表面粗糙度，并显示出铁磁性的签名。我们可以验证，在这些薄膜中的低频电阻波动（噪声）出现由于热激活的局部缺陷的波动，并通过结构表征的缺陷密度与在薄膜中看到的无序水平相匹配。
英文摘要：
We have carried out extensive comparative studies of the structural and transport properties of CaRuO$_3$ thin films grown under various oxygen pressure. We find that the preferred orientation and surface roughness of the films are strongly affected by the oxygen partial pressure during growth. This in turn affects the electrical and magnetic properties of the films. Films grown under high oxygen pressure have the least surface roughness and show transport characteristics of a good metal down to the lowest temperature measured. On the other hand, films grown under low oxygen pressures have high degree of surface roughness and show signatures of ferromagnetism. We could verify that the low frequency resistance fluctuations (noise) in these films arise due to thermally activated fluctuations of local defects and that the defect density matches with the level of disorder seen in the films through structural characterizations.
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