利用ENZ纳米腔实现高分辨率双光子直接Laser写入
Hyper Resolution Two Photon Direct Laser Writing using ENZ Nano-Cavity
摘要:
报道了一种提高双光子激光直写光刻分辨率的新技术。由于特殊的$\varepsilon_{NZ}$(近零)超材料特性实现了高准直,超薄介电超分辨纳米结构触手可及。相对于标准的直接激光写入方法,分别在高度和宽度上实现了$89\%$和$50\%$的尺寸减小,其中结构的高度在5nm和50nm之间可调。检索到的2D制造参数用于制造超分辨3D结构。特别地,已经实现了达芬奇的\textit{"Lady with an Ermine"}的高度详细的介电浅浮雕(全高度为500 nm)。概念验证结果显示了防伪应用、平面光学和光子学领域当前和趋势性研究方案的有趣线索。
英文摘要:
A novel technique is reported to improve the resolution of two-photon direct laser writing lithography. Thanks to the high collimation enabled by extraordinary $\varepsilon_{NZ}$ (near-zero) metamaterial features, ultra-thin dielectric hyper resolute nanostructures are within reach. With respect to the standard direct laser writing approach, a size reduction of $89\%$ and $50\%$ , in height and width respectively, is achieved with the height of the structures adjustable between 5nm and 50nm. The retrieved 2D fabrication parameters are exploited for fabricating hyper resolute 3D structures. In particular, a highly detailed dielectric bas-relief (500 nm of full height) of Da Vinci's \textit{"Lady with an Ermine"} has been realized. The proof-of-concept result shows intriguing cues for the current and trendsetting research scenario in anti-counterfeiting applications, flat optics and photonics.
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