arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2006.04775cond-mat.mes-hallcond-mat.mtrl-sci
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光致栅极屏蔽的动态如何使二维材料中谷物理的研究复杂化

How the dynamic of photo-induced gate screening complicates the investigation of valley physics in 2D materials

F. Volmer, M. Ersfeld, L. Rathmann, M. Heithoff, L. Kotewitz, K. Watanabe, T. Taniguchi, C. Stampfer, B. Beschoten

摘要:

对过渡金属二硫属化物等二维材料中的谷物理学进行深入分析需要测量作为电子能带结构内费米能级位置的函数的许多材料特性。这通常通过经由栅极电场效应改变2D材料的载流子密度来完成。在这里,我们表明,栅极相关的测量,这是在不同的测量条件下获得的比较可能会遇到重大的问题,由于电介质层内或其界面处的陷阱态的充电的时间演变。例如,由于施主和受主态的光激发,在光学测量中,栅极扫描方向和扫描速率对整个栅极的依赖性变得特别显著。在这样的条件下,相同的标称栅极电压可能导致不同的栅极感应载流子密度,并因此导致不同的费米能级位置。我们证明,从或甚至通过介电层通过漏电流的电流流动可以显着减少在2D材料的光学测量的栅极可调谐性。

英文摘要:

An in-depth analysis of valley physics in 2D materials like transition metal dichalcogenides requires the measurement of many material properties as a function of Fermi level position within the electronic band structure. This is normally done by changing the charge carrier density of the 2D material via the gate electric field effect. Here, we show that a comparison of gate-dependent measurements, which were acquired under different measurement conditions can encounter significant problems due to the temporal evolution of the charging of trap states inside the dielectric layer or at its interfaces. The impact of, e.g., the gate sweep direction and the sweep rate on the overall gate dependence gets especially prominent in optical measurements due to photo-excitation of donor and acceptor states. Under such conditions the same nominal gate-voltage may lead to different gate-induced charge carrier densities and, hence, Fermi level positions. We demonstrate that a current flow from or even through the dielectric layer via leakage currents can significantly diminish the gate tunability in optical measurements of 2D materials.

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