arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2005.07878physics.app-phcond-mat.mtrl-sci
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飞秒laser激发半导体表面产生太赫兹波的简化公式

Simplified formulas for the generation of terahertz waves from semiconductor surfaces excited with a femtosecond laser

Masayoshi Tonouchi

摘要:

我们推导出简单的公式来解释太赫兹(THz)辐射从半导体表面激发的飞秒(fs)激光。具有大于带隙的能量的飞秒光脉冲产生光载流子,其根据光电流的时间导数行进并产生THz辐射。通过假设只有在超快时间尺度(小于几百fs)中行进的电子对太赫兹辐射有贡献,可以获得源于用内建场加速的光载流子漂移或来自光载流子扩散的发射的简单表达式。前者的发射振幅与电子迁移率、肖特基势垒高度和激光强度成正比,后者的发射振幅与激光强度和扩散系数的平方成正比。我们还讨论了金属-绝缘体-半导体结构的发射公式。推导的表达式有助于理解激光太赫兹发射显微镜(LTEM)观测到的太赫兹发射特性,使LTEM在半导体研究和开发领域得到实际应用。

英文摘要:

We derive simple formulas to explain terahertz (THz) emission from semiconductor surfaces excited by a femtosecond (fs) laser. Femtosecond optical pulses with energies larger than the bandgap create photocarriers which travel and generate THz radiation, according to the time derivative of the photocurrent. By assuming that only electrons traveling in an ultrafast time scale, less than a few hundred fs, contribute to THz radiation, one can obtain simple expressions for the emission originating from the photocarrier drift accelerated with a built-in field or from the photocarrier diffusion. The emission amplitude of the former is in proportion with electron mobility, the Schottky-Barrier height, and the laser intensity and one of the latter with the laser intensity and diffusion coefficient squared. We also discuss the formula for emission from metal-insulator-semiconductor structures. The derived expressions are useful in understanding the THz emission properties observed by a laser THz emission microscope (LTEM), bringing LTEM into real applications in the field of semiconductor research and development.

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