光刻掩模形状重构的高效贝叶斯反演
Efficient Bayesian inversion for shape reconstruction of lithography masks
摘要：
背景：散射测量是一种快速、间接和非破坏性的光学方法，用于光刻掩模生产中的质量控制。为了解决符合即将到来的需要提高精度的逆问题，计算昂贵的前向模型必须被定义，其映射几何参数到衍射光强度。目的：为了量化几何参数重建中的不确定性，必须引入快速评估正演模型的代理。方法：我们使用一个非侵入性的多项式混沌近似的前向模型，提高了速度，从而使探索后，通过直接贝叶斯推断。此外，该代理允许在没有额外计算开销的情况下进行全局敏感性分析。结果如下：这种方法产生关于硅线光栅的几何参数的完整分布的信息，这反过来允许以参数的均值、方差和高阶矩的形式量化重构不确定性。结论：使用多项式混沌代理允许量化参数的影响和重建的不确定性。这种方法很容易使用，因为不需要昂贵的前向模型的适应。
英文摘要：
Background: Scatterometry is a fast, indirect and non-destructive optical method for quality control in the production of lithography masks. To solve the inverse problem in compliance with the upcoming need for improved accuracy, a computationally expensive forward model has to be defined which maps geometry parameters to diffracted light intensities. Aim: To quantify the uncertainties in the reconstruction of the geometry parameters, a fast to evaluate surrogate for the forward model has to be introduced. Approach: We use a non-intrusive polynomial chaos based approximation of the forward model which increases speed and thus enables the exploration of the posterior through direct Bayesian inference. Additionally, this surrogate allows for a global sensitivity analysis at no additional computational overhead. Results: This approach yields information about the complete distribution of the geometry parameters of a silicon line grating, which in return allows to quantify the reconstruction uncertainties in the form of means, variances and higher order moments of the parameters. Conclusion: The use of a polynomial chaos surrogate allows to quantify both parameter influences and reconstruction uncertainties. This approach is easy to use since no adaptation of the expensive forward model is required.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
