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arXiv 2003.12716physics.opticseess.IV

Ptychographic X-ray Speckle Tracking with Multi Layer Laue Lens Systems

Andrew James Morgan, Kevin T. Murray, Mauro Prasciolu, Holger Fleckenstein, Oleksandr Yefanov, Pablo Villanueva-Perez, Valerio Mariani, Martin Domaracky, Manuel… 展开作者

Andrew James Morgan, Kevin T. Murray, Mauro Prasciolu, Holger Fleckenstein, Oleksandr Yefanov, Pablo Villanueva-Perez, Valerio Mariani, Martin Domaracky, Manuela Kuhn, Steve Aplin, Istwan Mohacsi, Marc Messerschmidt, Karolina Stachnik, Yang Du, Anja Burkhart, Alke Meents, Evgeny Nazaretski, Hanfei Yan, Xiaojing Huang, Yong Chu, Henry N. Chapman, Saša Bajt

英文摘要:

The ever-increasing brightness of synchrotron radiation sources demands improved x-ray optics to utilise their capability for imaging and probing biological cells, nano-devices, and functional matter on the nanometre scale with chemical sensitivity. Hard x-rays are ideal for high-resolution imaging and spectroscopic applications due to their short wavelength, high penetrating power, and chemical sensitivity. The penetrating power that makes x-rays useful for imaging also makes focusing them technologically challenging. Recent developments in layer deposition techniques that have enabled the fabrication of a series of highly focusing x-ray lenses, known as wedged multi layer Laue lenses. Improvements to the lens design and fabrication technique demands an accurate, robust, in-situ and at-wavelength characterisation method. To this end, we have developed a modified form of the speckle-tracking wavefront metrology method, the ptychographic x-ray speckle tracking method, which is capable of operating with highly divergent wavefields. A useful by-product of this method, is that it also provides high-resolution and aberration-free projection images of extended specimens. We report on three separate experiments using this method, where we have resolved ray path angles to within 4 nano-radians with an imaging resolution of 45nm (full-period). This method does not require a high degree of coherence, making it suitable for lab based x-ray sources. Likewise it is robust to errors in the registered sample positions making it suitable for x-ray free-electron laser facilities, where beam pointing fluctuations can be problematic for wavefront metrology.

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