arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2003.06625cond-mat.mtrl-sciphysics.chem-phphysics.comp-ph
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高压下氩与氙反应性的预测

Prediction of the Reactivity of Argon with Xenon under High Pressure

Xiao Z. Yan, Yang M. Chen, Hua Y. Geng

摘要:

压力显著改变了凝聚相中的微观相互作用,导致新的键合模式和非常规化学。氩和氙都具有封闭的电子结构,这使得它们在化学上不起反应。使用无偏结构搜索技术结合第一性原理计算,我们证明了在低至1.1 GPa的压力下氩与氙的反应,产生一种新的范德华化合物XeAr 2,它在MgCu 2型Laves相结构中结晶。由于最外层电子的压力诱导离域,已经检测到共价Xe-Ar键和Xe-Ar键,这导致XeAr 2在至少高达500 GPa下出乎意料地稳定而没有任何相变或分解。

英文摘要:

Pressure significantly modifies the microscopic interactions in condense phase, leading to new patterns of bonding and unconventional chemistry. Both argon and xenon possess closed-shell electronic structures, which renders them chemically unreactive. Using unbiased structure searching techniques combined with first-principles calculations, we demonstrate the reaction of argon with xenon at a pressure as low as 1.1 GPa, producing a novel van der Waals compound XeAr2, which crystallizes in the MgCu2-type Laves phase structure. Due to the pressure-induced delocalization of the electrons in outermost shells, the covalent Xe-Xe and Xe-Ar bonds have been detected which lead XeAr2 to be unexpectedly stable without any phase transition or decomposition at least up to 500 GPa.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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