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arXiv 2002.10114cond-mat.quant-gasphysics.plasm-ph
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量子等离子体中类氢离子的基态能量

Ground State Energy of Hydrogen-Like Ions in Quantum Plasmas

M. Akbari-Moghanjoughi, Alireza Abdikian, Arash Phirouznia

摘要:

本文用渐近迭代法(AIM)研究了完全简并电子气中氢和类氦静态离子1 s能级的变化。比较了半经典的Shukla-Eliasson(SE)模型和修正的Shukla-Eliasson(cSE)模型。值得注意的是,这些模型合并到真空水平的氢和氦类离子在稀经典电子气制度。虽然在TF模型中,氢基态能级随着电子浓度的增加而单调地向连续极限提升,但在SE和cSE模型中,通过能量最小化的普遍束缚稳定谷发生在特定的电子浓度范围内,对于cSE模型,该电子浓度范围与典型金属中的电子浓度紧密匹配。后者的稳定机制似乎是由于等离子体激元激发和金属密度区的费米长度尺度之间的相互作用。考虑电子交换和关联效应的cSE模型的应用表明,在自由电子假设的框架内,cSE模型定性地解释了元素金属的数密度和晶格参数.根据静电屏蔽的cSE模型,定义了一个简单的金属-绝缘体转变判据。目前的研究可以进一步阐明金属化合物的形成和介电性能的基本物理机制。

英文摘要:

Using the asymptotic iteration method (AIM) we investigate the variation in the 1s energy levels of hydrogen and helium-like static ions in fully degenerate electron gas. The semiclassical Thomas-Fermi (TF), Shukla-Eliasson (SE) and corrected Shukla-Eliasson (cSE) models are compared. It is remarked that these models merge into the vacuum level for hydrogen and helium-like ions in the dilute classical electron gas regime. While in the TF model hydrogen ground state level lifts monotonically towards the continuum limit with increase in the electron concentration, in the SE and cSE models universal bound stabilization valley through the energy minimization occurs at a particular electron concentration range for the hydrogen-like ion which for cSE model closely matches the electron concentrations in typical metals. The later stabilizing mechanism appears to be due to the interaction between plasmon excitations and the Fermi lengthscales in metallic density regime. In the case of helium-like ions, however, no such stability mechanism is found. The application of cSE model with electron exchange and correlation effects reveals that cSE model qualitatively accounts for the number-density and lattice parameters of elemental metals within the framework of free electron assumption. According to the cSE model of static charge screening a simple metal-insulator transition criterion is defined. Current investigation may further elucidate the underlying physical mechanisms in the formation and dielectric properties of metallic compounds.

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