利用规则化数字超材料实现片上多通道聚焦波分复用
Implementation of on-chip multi-channel focusing wavelength demultiplexing with regularized digital metamaterials
摘要：
绝热波导锥和片上波分复用器是光子集成电路的关键器件。然而，这两类器件采用传统的半解析法或蛮力搜索法设计，往往尺寸较大。在这里，基于正则化的数字超材料，我们已经设计，制造和表征了一个双通道聚焦波长解复用器的足迹为2.4 × 10微米2。所设计的解复用器可以在不需要绝热波导锥的情况下直接与光栅耦合器相连。采用目标优先法和改进的最速下降法设计了一种将1520 nm和1580 nm的光从10 um宽的输入波导分束到两个0.48 um宽的输出波导的解复用器。实验结果表明，该解复用器上（下）通道的插入损耗为-1.77dB（-2.10dB），串扰为-25.17dB（-12.14dB）。此外，模拟结果还表明，器件的刻蚀深度容差可达20 nm，平面尺寸变化容差可达10 nm。受益于我们设计方法的可扩展性，我们可以设计其他类型的超紧凑型“聚焦”器件，如模式分离器，模式转换器和功率分配器，我们也可以设计具有更复杂功能的器件，例如，我们设计了一个三通道聚焦波长解复用器。
英文摘要：
Adiabatic waveguide taper and on-chip wavelength demultiplexer are the key components of photonic integrated circuits. However, these two kinds of devices which designed by traditional semi-analytic methods or brute-force search methods usually have large size. Here, based on regularized digital metamaterials, we have designed, fabricated and characterized a two-channel focused wavelength demultiplexer with a footprint of 2.4 x 10 um2. The designed demultiplexer can directly connect to a grating coupler under the absence of an adiabatic waveguide taper. The objective first method and modified steepest descent method are used to design the demultiplexer which splits 1520 nm and 1580 nm light from a 10-um-wide input waveguide into two 0.48-um-wide output waveguides. Experimental results show that the insertion loss of the upper (lower) channel of the demultiplexer is -1.77 dB (-2.10 dB) and the crosstalk is -25.17 dB (-12.14 dB). Besides, the simulation results indicate that the fabrication tolerance of our devices can reach 20 nm in etching depth and 10 nm in plane size changing. Benefit From the extensibility of our design method, we can design other types of ultra-compact 'focused' devices, like mode splitters, mode converters and power splitters, and we can also design devices with more complicated functionalities, for example, we have designed a three-channel focused wavelength demultiplexer.
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