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arXiv 1908.07468physics.acc-ph
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具有亚微米分辨率的纳米制造独立式线阵扫描器

Nano-Fabricated Free-Standing Wire-Scanners with Sub-Micrometer Resolution

G. L. Orlandi, C. David, E. Ferrari, V. A. Guzenko, B. Hermann, R. Ischebeck, E. Prat, M. Ferianis, G. Penco, M. Veronese, N. Cefarin, S. Dal Zilio, M. Lazzarino

摘要:

新型粒子加速器(如激光和等离子体驱动的加速器)的发展以及新一代X射线设备严格的束流规格要求对束流横向轮廓的诊断具有更高的空间分辨率。在直线加速器驱动的自由电子激光器(FEL)中,空间分辨率约束与对诊断的进一步要求相结合,所述诊断是最小侵入性的,以便保护辐射敏感部件(例如,波荡器)并保存激光发射机制。对于自由电子激光束横向轮廓的高分辨率测量,线阵扫描(WS)是首选的诊断方法。然而,传统的WS包括一个金属线(束探针)拉伸到一个框架(叉),可以提供最好的均方根空间分辨率在微米尺度与电子束上的等效表面的影响。为了将WS的空间分辨率提高到微米级以上,同时提高WS对激光的透明度,PSI和FERMI正在独立地采用纳米光刻技术来制造完全集成到叉子中的独立的亚微米宽WS光束探针。具有约250 nm的几何分辨率的独立WS已在SwissFEL成功地进行了测试,其中具有400-500 nm的垂直尺寸的低电荷电子束已被表征。进一步的实验测试在瑞士自由电子激光在标称束电荷为200 pC证实了弹性的热负荷的纳米制造WS。在这项工作中,纳米制造的独立WS的细节,以及电子束表征的结果。

英文摘要:

Diagnostics of the beam transverse profile with ever more demanding spatial resolution is required by the progress on novel particle accelerators - such as laser and plasma driven accelerators - and by the stringent beam specifications of the new generation of X-ray facilities. In a linac driven Free-Electron-Laser (FEL), the spatial resolution constraint joins with the further requirement for the diagnostics to be minimally invasive in order to protect radiation sensitive components - such as the undulators - and to preserve the lasing mechanism. As for high resolution measurements of the beam transverse profile in a FEL, wire-scanners (WS) are the top-ranked diagnostics. Nevertheless, conventional WS consisting of a metallic wire (beam-probe) stretched onto a frame (fork) can provide at best a rms spatial resolution at the micrometer scale along with an equivalent surface of impact on the electron beam. In order to improve the spatial resolution of a WS beyond the micrometer scale along with the transparency to the lasing, PSI and FERMI are independently pursuing the technique of the nano-lithography to fabricate a free-standing and sub-micrometer wide WS beam-probe fully integrated into a fork. Free-standing WS with a geometrical resolution of about 250 nm have been successfully tested at SwissFEL where low charge electron beams with a vertical size of 400-500 nm have been characterized. Further experimental tests carried out at SwissFEL at the nominal beam charge of 200 pC confirmed the resilience to the heat-loading of the nano-fabricated WS. In this work, details on the nano-fabrication of free-standing WS as well as results of the electron-beam characterization are presented.

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