arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1908.00609cond-mat.mes-hallcond-mat.mtrl-sci
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MoS2在超扁平金属上的层间输运和光电性质

Layer Dependent Interfacial Transport and Optoelectrical Properties of MoS2 on Ultra-flat Metals

Hao Lee, S. Deshmukh, Jing Wen, V. Z. Costa, J. S. Schuder, M. Sanchez, A. S. Ichimura, Eric Pop, Bin Wang, A. K. M. Newaz

摘要:

过渡金属二硫属化合物(TMD)是一种层状半导体范德华晶体,在电子和光电子器件中具有广泛的应用前景。实现实际的电气和光电子器件应用需要金属结和TMD半导体之间的连接。因此,一个完整的理解电子能带的排列和势垒高度管理通过金属TMD金属结的运输是至关重要的。但是,有一个知识差距;目前还不清楚TMD的能带如何排列,而与金属接触,作为层数的函数。为了消除这种知识差距,我们已经对固定在超平导电Au表面(均方根(RMS)表面粗糙度<0.2 nm)和氧化铟锡(ITO)衬底(RMS表面粗糙度<0.7 nm)上的几层(1-5)MoS 2进行了导电原子力显微镜(CAFM),形成垂直金属(导电AFM尖端)-光刻机-金属器件。我们已经观察到,随着层数增加到5层,电流增加。应用Fowler-Nordheim隧穿理论,我们确定了不同层的势垒高度,并观察到势垒高度随着层数的增加而降低。利用密度泛函理论计算,我们成功地证明了势垒高度随着层数的增加而降低。通过在透明的超平坦导电ITO基板上照射TMD,我们观察到与在黑暗中测量的电流相比,电流降低,因此证明了负光电导性。我们的研究提供了一个基本的了解TMD-金属结的局部电子和光电行为,并可能铺平了道路,发展纳米电子器件与定制层依赖的传输特性。

英文摘要:

Transition metal dichalcogenides (TMDs) are layered semiconducting van der Waal crystals and promising materials for a wide range of electronic and optoelectronic devices. Realizing practical electrical and optoelectronic device applications requires a connection between a metal junction and a TMD semiconductor. Hence, a complete understanding of electronic band alignments and the potential barrier heights governing the transport through a metal-TMD-metal junction is critical. But, there is a knowledge gap; it is not clear how the energy bands of a TMD align while in contact with a metal as a function of the number of layers. In pursuit of removing this knowledge gap, we have performed conductive atomic force microscopy (CAFM) of few layered (1-5) MoS2 immobilized on ultra-flat conducting Au surfaces (root mean square (RMS) surface roughness <0.2 nm) and indium tin oxide (ITO) substrate (RMS surface roughness <0.7 nm) forming a vertical metal (conductive-AFM tip)-semiconductor-metal device. We have observed that the current increases as the number of layers increases up to 5 layers. By applying Fowler-Nordheim tunneling theory, we have determined the barrier heights for different layers and observed that the barrier height decreases as the number of layers increases. Using density functional theory (DFT) calculation, we successfully demonstrated that the barrier height decreases as the layer number increases. By illuminating the TMDs on a transparent ultra-flat conducting ITO substrate, we observed a reduction in current when compared to the current measured in the dark, hence demonstrating negative photoconductivity. Our study provides a fundamental understanding of the local electronic and optoelectronic behaviors of TMD-metal junction, and may pave an avenue toward developing nanoscale electronic devices with tailored layer-dependent transport properties.

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