HiPIMS磁化等离子体余辉诊断
HiPIMS magnetized plasma afterglow diagnostic
摘要：
使用高功率脉冲磁控溅射（HIPIMS）技术沉积抵抗侵蚀性环境条件的薄膜代表了技术挑战。为了建立最佳的操作条件，需要知道在脉冲阴极电流结束时磁化等离子体的寿命。我们开发的桌面系统允许测量所有操作HiPIMS类型的寿命，无论是短脉冲还是长脉冲，基于施加具有非常短的上升时间的电压脉冲时电流的快速增加，直到取决于初始磁化等离子体特性的值。
英文摘要：
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it is desirable to know the lifetime of the magnetized plasma at the end of the pulsed cathode current. The table-top system we developed allows one to measure the lifetime for all operating HiPIMS types, both for short and long pulses, based on the rapid increase of the current when applying a voltage pulse with very short rise time, up to a value which depends of the initial magnetized plasma characteristics.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
