通过使用无相互作用测量和条件再照明减少电子显微镜中的损伤
Reduced damage in electron microscopy by using interaction-free measurement and conditional re-illumination
摘要：
无相互作用测量（IFM）已被提出作为一种高分辨率，低损伤的辐射敏感样品，如生物分子和蛋白质成像的手段。IFM的基本设置是马赫-曾德尔干涉仪，并且纳米制造电子衍射光栅的最新进展使得将马赫-曾德尔干涉仪并入透射电子显微镜（TEM）中成为可能。因此，IFM与这样的干涉仪和散粒噪声限制的电子源（如在TEM）的性能限制的兴趣。本文通过理论分析和数值模拟，比较了理想IFM和经典成像方案的错误概率和样本损伤。我们考虑了一个在每个像素处完全透明或完全不透明的样本。在我们的分析中，我们还评估了额外探测器对散射电子的影响。额外的检测器导致减少的误差高达一个数量级，IFM和经典计划。我们还研究了一个样本重新照明方案的基础上更新先验知识后，每轮照明，并发现该计划进一步减少了误差的一个因素。这些方法的实施是可能实现与现有的仪器，并会导致在低剂量电子显微镜的分辨率提高。
英文摘要：
Interaction-free measurement (IFM) has been proposed as a means of high-resolution, low-damage imaging of radiation-sensitive samples, such as biomolecules and proteins. The basic setup for IFM is a Mach-Zehnder interferometer, and recent progress in nanofabricated electron diffraction gratings has made it possible to incorporate a Mach-Zehnder interferometer in a transmission-electron microscope (TEM). Therefore, the limits of performance of IFM with such an interferometer and a shot-noise limited electron source (such as that in a TEM) are of interest. In this work, we compared the error probability and sample damage for ideal IFM and classical imaging schemes, through theoretical analysis and numerical simulation. We considered a sample that is either completely transparent or completely opaque at each pixel. In our analysis, we also evaluated the impact of an additional detector for scattered electrons. The additional detector resulted in reduction of error by up to an order of magnitude, for both IFM and classical schemes. We also investigated a sample re-illumination scheme based on updating priors after each round of illumination and found that this scheme further reduced error by a factor of two. Implementation of these methods is likely achievable with existing instrumentation and would result in improved resolution in low-dose electron microscopy.
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