低温等离子体中硅纳米粒子凝聚的静电增强因子
Electrostatic enhancement factor for the coagulation of silicon nanoparticles in low-temperature plasmas
摘要：
在典型的低温氩-硅烷等离子体条件下，对不同纳米颗粒尺寸和电荷的硅纳米颗粒之间的静电（库仑和极化诱导）相互作用引起的凝血增强因子进行了数值计算。我们使用了一个严格的配方，多极矩系数的基础上，来描述完整的电介质粒子之间的静电相互作用。由此产生的相互作用势在接触点处是非奇异的，这允许适应轨道运动限制理论来计算增强因子。结果表明，由于诱导极化，凝聚增强中性带电粒子遇到几个数量级。此外，作为纳米颗粒的介电性质的直接结果，带相同电荷的纳米颗粒之间的短程力可以变得有吸引力。多极系数势的近似解析形式相比，可以很容易地用来简化计算。这里提出的结果提供了一个更好的理解凝聚的静电相互作用，并可用于尘埃生长模拟在低温等离子体凝聚是一个重要的过程。
英文摘要：
The coagulation enhancement factor due to electrostatic (Coulomb and polarization-induced) interaction between silicon nanoparticles was numerically computed for different nanoparticle sizes and charges in typical low-emperature argon-silane plasma conditions. We used a rigorous formulation, based on a multipole moment coefficients, to describe the complete electrostatic interaction between dielectric particles. The resulting interaction potential is non-singular at the contact point, which allows to adapt the orbital-motion limited theory to calculate the enhancement factor. It is shown that, due to induced polarization, coagulation is enhanced in neutral-charged particles encounters up to several orders of magnitude. Moreover, the short-range force between like-charged nanoparticles can become attractive as a direct consequence of the dielectric nature of the nanoparticles. The multipolar coefficient potential is compared to an approximate analytic form which can be readily used to simplify the calculations. The results presented here provide a better understanding of the electrostatic interaction in coagulation and can be used in dust growth simulations in low-temperature plasmas where coagulation is a significant process.
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