场发射电流的曲率修正
Curvature correction to the field emission current
摘要：
场发射体尖端的曲率导致改变的隧穿电势，当曲率的曲率半径小时，该改变的隧穿电势具有显著性。我们在这里提供了一个分析的曲率校正公式的场发射电流从平滑的垂直对齐的发射极尖端和测试其适用性在一个范围内的顶点半径，$R_a$，和本地电场，$E_a$。发现对于$R_a > 10$ nm给出了优异的结果，误差通常小于$10\%$。令人惊讶的是，对于未校正的电位，我们发现即使在$R_a = 100$ nm处的误差也很高（$ > 35\%$在$E_a = 3$ V/nm处），并得出结论，曲率校正对于小于1微米的顶点半径是必不可少的。
英文摘要：
The curvature of field emitter tips leads to an altered tunneling potential that assumes significance when the radius of curvature is small. We provide here an analytical curvature-corrected formula for the field emission current from smooth vertically aligned emitter tips and test its applicability across a range of apex radius, $R_a$, and local electric field, $E_a$. It is found to give excellent results for $R_a > 10$nm with errors generally less than $10\%$. Surprisingly, for the uncorrected potential, we find the errors to be high even at $R_a = 100$nm ($ > 35\%$ at $E_a = 3$V/nm) and conclude that curvature correction is essential for apex radius less than a micron.
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