共焦laser扫描显微镜：二维材料快速光学表征工具
Confocal laser scanning microscopy: A tool for rapid optical characterization of 2D materials
摘要：
共聚焦激光扫描显微镜（CLSM）是一种非破坏性、高效的光学表征方法，可用于不同基底上石墨烯的大面积分析，可在环境空气中应用，不需要额外的样品制备，不易受表面充电和表面污染的影响。CLSM利用石墨烯的光学特性，并提供大大增强的光学对比度和厚度映射到单层。我们通过测量Si/SiO2上的机械剥离和化学气相沉积石墨烯以及SiC上的外延石墨烯来证明CLSM的有效性。在Si/SiO2上的石墨烯的情况下，CLSM强度和高度映射对于1-5层石墨烯的分析是强大的。对于SiC衬底上的外延石墨烯，CLSM强度使我们能够区分诸如密集的平行的150 nm宽的石墨烯带（与生长过程的早期阶段相关）以及由界面层和1-3层石墨烯覆盖的大区域等特征。在这两种情况下，CLSM数据显示出良好的相关性与传统的光学显微镜，原子力显微镜，开尔文探针力显微镜，导电原子力显微镜，扫描电子显微镜和拉曼映射，大大减少了采集时间。我们证明了CLSM是快速分析大规模生产的石墨烯的不可或缺的工具，并且与其他2D材料同样相关。
英文摘要：
Confocal laser scanning microscopy (CLSM) is a non-destructive, highly-efficient optical characterization method for large-area analysis of graphene on different substrates, which can be applied in ambient air, does not require additional sample preparation, and is insusceptible to surface charging and surface contamination. CLSM leverages optical properties of graphene and provides greatly enhanced optical contrast and mapping of thickness down to a single layer. We demonstrate the effectiveness of CLSM by measuring mechanically exfoliated and chemical vapor deposition graphene on Si/SiO2, and epitaxial graphene on SiC. In the case of graphene on Si/SiO2, both CLSM intensity and height mapping is powerful for analysis of 1-5 layers of graphene. For epitaxial graphene on SiC substrates, the CLSM intensity allows us to distinguish features such as dense, parallel 150 nm wide ribbons of graphene (associated with the early stages of the growth process) and large regions covered by the interfacial layer and 1-3 layers of graphene. In both cases, CLSM data shows excellent correlation with conventional optical microscopy, atomic force microscopy, Kelvin probe force microscopy, conductive atomic force microscopy, scanning electron microscopy and Raman mapping, with a greatly reduced acquisition time. We demonstrate that CLSM is an indispensable tool for rapid analysis of mass-produced graphene and is equally relevant to other 2D materials.
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