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arXiv 1802.04854astro-ph.IM
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具有整体抗反射层的叠层硅梯度折射率光学器件

Stacked Wafer Gradient Index Silicon Optics with Integral Anti-reflection Layers

F. Defrance, G. Chattopadhyay, J. Connors, S. Golwala, M. I. Hollister, C. Jung-Kubiak, E. Padilla, S. Radford, J. Sayers, E. C. Tong, H. Yoshida

备注：
A more detailed article has been written and is now available in arXiv (arXiv:1803.05168) and published in Applied Optics (doi: 10.1364/AO.57.005196)
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摘要：

具有宽带抗反射（AR）涂层的硅光学器件是由多层织构硅表面制成的，用于毫米和亚毫米波长。单层和双层AR涂层被设计用于以250 GHz为中心的最佳传输，并使用DRIE（深反应离子蚀刻）技术制造。测试的高电阻率的硅晶片与单层涂层之间的75 GHz和330 GHz的模拟和比较。

英文摘要：

Silicon optics with wide bandwidth anti-reflection (AR) coatings, made of multi-layer textured silicon surfaces, are developed for millimeter and submillimeter wavelengths. Single and double layer AR coatings were designed for an optimal transmission centered on 250 GHz, and fabricated using the DRIE (Deep Reaction Ion Etching) technique. Tests of high resistivity silicon wafers with single-layer coatings between 75 GHz and 330 GHz are presented and compared with the simulations.

机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。

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