具有电容式距离控制的光刻真空掩模对准器
Mask aligner for ultrahigh vacuum with capacitive distance control
摘要：
我们提出了一个由三个压电电机驱动的掩模对准器，它可以引导和对准电容控制下的SiN荫罩朝向样品表面。用于读出的三个电容器位于薄掩模的背面，使得掩模可以放置在离样品表面$μ$ m的距离处，同时保持其平行于表面。样品和掩模可以原位交换，并且掩模可以另外平行于表面移位。我们证明了沉积结构的边缘锐度低于100 nm，这可能受到沉积Au在Si（111）上的扩散的限制。
英文摘要：
We present a mask aligner driven by three piezo motors which guides and aligns a SiN shadow mask under capacitive control towards a sample surface. The three capacitors for read out are located at the backside of the thin mask such that the mask can be placed in $μ$m distance from the sample surface, while keeping it parallel to the surface. Samples and masks can be exchanged in-situ and the mask can additionally be displaced parallel to the surface. We demonstrate an edge sharpness of the deposited structures below 100 nm, which is likely limited by the diffusion of the deposited Au on Si(111).
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