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arXiv 1711.04429cond-mat.mtrl-sci
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金刚石近表面致密氮空位中心系综的自旋性质

Spin properties of dense near-surface ensembles of nitrogen-vacancy centres in diamond

J. -P. Tetienne, R. W. de Gille, D. A. Broadway, T. Teraji, S. E. Lillie, J. M. McCoey, N. Dontschuk, L. T. Hall, A. Stacey, D. A. Simpson, L. C. L. Hollenberg

摘要:

本文研究了氮离子注入金刚石近表面氮空位(NV)中心形成的致密层的自旋性质。光学检测的磁共振对比度和线宽,自旋相干时间,和自旋弛豫时间,测量作为注入能量,剂量,退火温度和表面处理的函数。为了跟踪存在的损伤和表面相关的自旋缺陷,我们进行原位电子自旋共振光谱通过双电子-电子共振和交叉弛豫光谱的NV中心。我们发现,对于能量($4-30$ ~keV)和剂量($5\times10^{11}-10^{13}$ ~ions/cm $^2$)的范围内考虑,NV的自旋性质主要是由剂量通过残留的重结晶诱导的顺磁缺陷,但由此产生的磁灵敏度基本上是独立的剂量和能量。然后,我们表明,磁灵敏度显着改善高温退火在$\geq1100^\circ$ C。此外,除了自旋弛豫时间,这是显着减少的自旋性质没有显着影响氧退火。最后,通过核磁共振测量确定平均NV深度,在4-6 keV注入能量下给出$\approx10$ ~ 17 nm。这项研究揭示了为高灵敏度传感和成像应用创造近表面NV中心密集层的最佳条件。

英文摘要:

We present a study of the spin properties of dense layers of near-surface nitrogen-vacancy (NV) centres in diamond created by nitrogen ion implantation. The optically detected magnetic resonance contrast and linewidth, spin coherence time, and spin relaxation time, are measured as a function of implantation energy, dose, annealing temperature and surface treatment. To track the presence of damage and surface-related spin defects, we perform in situ electron spin resonance spectroscopy through both double electron-electron resonance and cross-relaxation spectroscopy on the NV centres. We find that, for the energy ($4-30$~keV) and dose ($5\times10^{11}-10^{13}$~ions/cm$^2$) ranges considered, the NV spin properties are mainly governed by the dose via residual implantation-induced paramagnetic defects, but that the resulting magnetic sensitivity is essentially independent of both dose and energy. We then show that the magnetic sensitivity is significantly improved by high-temperature annealing at $\geq1100^\circ$C. Moreover, the spin properties are not significantly affected by oxygen annealing, apart from the spin relaxation time, which is dramatically decreased. Finally, the average NV depth is determined by nuclear magnetic resonance measurements, giving $\approx10$-17~nm at 4-6 keV implantation energy. This study sheds light on the optimal conditions to create dense layers of near-surface NV centres for high-sensitivity sensing and imaging applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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