包含集群设备的光刻工艺调度
On Scheduling a Photolithography Process Containing Cluster Tools
摘要：
光刻通常是半导体制造中的瓶颈工艺。在本文中，我们提出了一个模型，用于优化调度的光刻过程中存在的个人和集群工具。处理半导体制造工艺流程的各个层（阶段）的这些单独和集群工具的组合是一种特殊类型的灵活流水作业。我们分别寻求最小化总加权完成时间和最大化准时交货性能。实验结果表明，我们的解决方案的算法显示承诺，为现实世界的实施，因为它们可以帮助提高资源利用率，减少作业完成时间，并减少不必要的延迟在晶圆制造厂。
英文摘要：
Photolithography is typically the bottleneck process in semiconductor manufacturing. In this paper, we present a model for optimizing the scheduling of the photolithography process in the presence of both individual and cluster tools. The combination of these individual and cluster tools that process various layers (stages) of the semiconductor manufacturing process flow is a special type of flexible flowshop. We seek separately to minimize total weighted completion time and maximize on-time delivery performance. Experimental results suggest that our solution algorithms show promise for real world implementation as they can help to improve resource utilization, reduce job completion times, and decrease unnecessary delays in a wafer fab.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
