碳污染B4C-Coated光学器件在低压RF等离子体化学选择性清洗后的表征
Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma
摘要：
碳化硼（B4 C）是少数几种材料之一，其预期相对于由自由电子激光（FEL）产生的光子束的极高亮度是最有弹性的，并且因此对于该领域中的光学应用是相当感兴趣的。然而，与在现代光源设施中操作的许多其他光学器件的情况一样，B4 C涂覆的光学器件受到无处不在的碳污染。由于光子通量、光束相干性、相消干涉的产生和散射损失的严重减少，这些污染代表了高性能自由电子激光光束线的操作的严重问题。不同的实验室开发了各种B4 C清洁技术，并取得了不同的成功。我们提出了一项关于低压射频等离子体清洁碳污染的B4 C测试样品通过电感耦合O2/Ar，H2/Ar，和纯O2射频等离子体产生以下先前的研究使用相同的IBSS GV 10 x下游等离子体源。结果有关的化学，形态以及其他方面的B4 C光学涂层之前和之后的等离子体清洗的报告。我们从这些比较等离子体工艺中得出结论，纯O2原料等离子体仅表现出维持B4 C光学涂层完整性所需的化学选择性。
英文摘要：
Boron carbide (B4C) is one of the few materials that is expected to be mostly resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at modern light source facilities, B4C-coated optics are subject to ubiquitous carbon contaminations. These contaminations represent a serious issue for the operation of high performance FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B4C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B4C test samples via inductively coupled O2/Ar, H2/Ar, and pure O2 RF plasma produced following previous studies using the same IBSS GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B4C optical coating before and after the plasma cleaning are reported. We conclude from these comparative plasma processes that pure O2 feedstock plasma only exhibits the required chemical selectivity for maintaining the integrity of the B4C optical coating.
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