在CMOS铸造厂上制造超高Q光机械晶体腔
Ultrahigh-Q optomechanical crystals cavities fabricated on a CMOS foundry
摘要：
光子晶体使用周期性结构来创建光波传播的禁频区，这允许在小尺寸器件中创建和集成复杂的光学功能。这种策略也已成功地应用于限制机械波，并探讨他们与光的相互作用，在所谓的光机械腔。由于其具有挑战性的设计，这些腔体传统上是使用专用的高分辨率电子束光刻工具制造的，这些工具本身就很慢，限制了这种解决方案的小规模应用或研究。在这里，我们将展示如何克服这个问题，通过使用深紫外光刻工艺制造光机械晶体上的商业CMOS代工厂。我们表明，一个精心设计的光子晶体可以承受的光刻工艺的限制，生产腔与测量的固有光学品质因数高达$Q_{i}=(1.21\pm0.02)\times10^{6}$。还使用声子晶体来创建光机械晶体，以将声波紧密地限制在光学腔内，这导致$g_{0}=2π\times(91\pm4)$ kHz的测量真空光机械耦合速率。有效的边带冷却和放大也证明了，因为这些腔在解决边带制度。在设计和制造过程中的进一步改进表明，基于商业铸造的光机械腔可以用于量子基态冷却。
英文摘要：
Photonic crystals use periodic structures to create forbidden frequency regions for optical wave propagation, that allow for the creation and integration of complex optical functions in small footprint devices. Such strategy has also been successfully applied to confine mechanical waves and to explore their interaction with light in the so-called optomechanical cavities. Because of their challenging design, these cavities are traditionally fabricated using dedicated high-resolution electron-beam lithography tools that are inherently slow, limiting this solution to small-scale applications or research. Here we show how to overcome this problem by using a deep-UV photolithography process to fabricate optomechanical crystals on a commercial CMOS foundry. We show that a careful design of the photonic crystals can withstand the limitations of the photolithography process, producing cavities with measured intrinsic optical quality factors as high as $Q_{i}=(1.21\pm0.02)\times10^{6}$. Optomechanical crystals are also created using phononic crystals to tightly confine the sound waves within the optical cavity that results in a measured vacuum optomechanical coupling rate of $g_{0}=2π\times(91\pm4)$ kHz. Efficient sideband cooling and amplification are also demonstrated since these cavities are in the resolved sideband regime. Further improvement in the design and fabrication process suggest that commercial foundry-based optomechanical cavities could be used for quantum ground-state cooling.
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