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arXiv 1607.03409cond-mat.mes-hall
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量子隧穿效应对自旋霍尔磁电阻效应的影响

Effect of Quantum Tunneling on Spin Hall Magnetoresistance

Seulgi Ok, Wei Chen, Manfred Sigrist, Dirk Manske

摘要:

我们提出了一种形式主义,同时结合了量子隧穿和自旋扩散的影响自旋霍尔磁电阻在正常的金属/铁磁绝缘体双层(如Pt/YIG)和正常的金属/铁磁金属双层(如Pt/Co),其中磁化的角度影响正常金属的磁电阻。在正常金属侧中,已知自旋扩散影响由自旋霍尔效应引起的自旋累积的景观以及随后的磁阻,而在铁磁体侧,量子隧穿效应对界面自旋电流是有害的,这也影响自旋累积。通用的材料特性,如自旋扩散长度,层厚度,界面耦合,绝缘间隙的影响可以量化在一个统一的方式,并建议实验,揭示的量子特征的磁阻。

英文摘要:

We present a formalism that simultaneously incorporates the effect of quantum tunneling and spin diffusion on spin Hall magnetoresistance observed in normal metal/ferromagnetic insulator bilayers (such as Pt/YIG) and normal metal/ferromagnetic metal bilayers (such as Pt/Co), in which the angle of magnetization influences the magnetoresistance of the normal metal. In the normal metal side the spin diffusion is known to affect the landscape of the spin accumulation caused by spin Hall effect and subsequently the magnetoresistance, while on the ferromagnet side the quantum tunneling effect is detrimental to the interface spin current which also affects the spin accumulation. The influence of generic material properties such as spin diffusion length, layer thickness, interface coupling, and insulating gap can be quantified in a unified manner, and experiments that reveal the quantum feature of the magnetoresistance are suggested.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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