常压等离子体制备（超）疏水氟化表面及其织构化过程
Synthesis and texturization processes of (super)-hydrophobic fluorinated surfaces by atmospheric plasma
摘要：
通过大气等离子体的氟化表面的合成和织构化过程的研究，并提出通过综合研究的等离子体相和所得的材料表面。三种方法提高表面疏水性的超疏水表面的生产进行了评估：（i）聚四氟乙烯（PTFE）表面的改性，（ii）氟化涂层的等离子体沉积和（iii）将纳米粒子纳入这些氟化膜。在所有的方法中，等离子体气体的性质似乎是所需性质的关键参数。虽然用纯氦等离子体可以获得PTFE表面的更高蚀刻，但只有在向等离子体中加入O2时才能产生纹理化，这同时降低了总蚀刻。通过介质阻挡放电沉积CxFy膜导致疏水涂层的水接触角（WCA）为115{ \textdegree }，但只有辅助氩气放电诱导更高的WCA。最后，纳米颗粒沉积在氟化层下以增加表面粗糙度，从而产生超疏水混合涂层，其特征在于在表面处的水滴的非粘附性。
英文摘要：
The synthesis and texturization processes of fluorinated surfaces by means of atmospheric plasma are investigated and presented through an integrated study of both the plasma phase and the resulting material surface. Three methods enhancing the surface hydrophobicity up to the production of super-hydrophobic surfaces are evaluated: (i) the modification of a polytetrafluoroethylene (PTFE) surface, (ii) the plasma deposition of fluorinated coatings and (iii) the incorporation of nanoparticles into those fluorinated films. In all the approaches, the nature of the plasma gas appears to be a crucial parameter for the desired property. Although a higher etching of the PTFE surface can be obtained with a pure helium plasma, the texturization can only be created if O2 is added to the plasma, which simultaneously decreases the total etching. The deposition of CxFy films by a dielectric barrier discharge leads to hydrophobic coatings with water contact angles (WCAs) of 115{\textdegree}, but only the filamentary argon discharge induces higher WCAs. Finally, nanoparticles were deposited under the fluorinated layer to increase the surface roughness and therefore produce super-hydrophobic hybrid coatings characterized by the nonadherence of the water droplet at the surface.
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