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arXiv 1602.06340cond-mat.str-elcond-mat.mes-hall
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温度和电场诱导的原子层沉积二氧化钒薄膜的金属-绝缘体转变

Temperature and Electric Field Induced Metal-Insulator Transition in Atomic Layer Deposited Vanadium Dioxide Thin Films

Marko J. Tadjer, Virginia D. Wheeler, Brian P. Downey, Zachary R. Robinson, David J. Meyer, Charles R. Eddy,, Fritz J. Kub

摘要:

通过原子层沉积(ALD)沉积的非晶二氧化钒(VO $_{2}$)膜在低氧压(10 $^{-4}$至10 $^{-5}$ Torr)下在660-670 $°$ ℃下通过非原位退火结晶1-2小时。在这些条件下,结晶VO $_{2}$相得以保持,而V $_{2}$ O $_{5}$相的形成受到抑制。在37-60 $°$ C范围内观察到从绝缘体到金属相的电转变,其中R $_{ON}$ /R $_{OFF}$比高达约750,临界转变温度为7-10 $°$ C。施加在两端器件结构上的电场引起可逆相变,在用2小时长的退火处理的VO $_{2}$样品中具有约25 kV/cm的室温转变场。场致MIT滞后的宽度和斜率均取决于VO $_{2}$的结晶质量。

英文摘要:

Amorphous vanadium dioxide (VO$_{2}$) films deposited by atomic layer deposition (ALD) were crystallized with an ex situ anneal at 660-670 $°$C for 1-2 hours under a low oxygen pressure (10$^{-4}$ to 10$^{-5}$ Torr). Under these conditions the crystalline VO$_{2}$ phase was maintained, while formation of the V$_{2}$O$_{5}$ phase was suppressed. Electrical transition from the insulator to the metallic phase was observed in the 37-60 $°$C range, with a R$_{ON}$/R$_{OFF}$ ratio of up to about 750 and critical transition temperature of 7-10 $°$C. Electric field applied across two-terminal device structures induced a reversible phase change, with a room temperature transition field of about 25 kV/cm in the VO$_{2}$ sample processed with the 2 hr long anneal. Both the width and slope of the field induced MIT hysteresis were dependent upon the VO$_{2}$ crystalline quality.

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