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arXiv 1601.02579physics.optics
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分散橙11染料掺杂PMMA与分散ZrO $_2$纳米粒子的随机激光和可逆光降解

Random Lasing and Reversible Photodegradation in Disperse Orange 11 Dye-Doped PMMA with Dispersed ZrO$_2$ Nanoparticles

Benjamin R. Anderson, Ray Gunawidjaja, Hergen Eilers

摘要:

我们报道了在分散有ZrO $_2$纳米颗粒的分散橙11染料掺杂的PMMA(DO 11/PMMA)中观察到的645 nm强度反馈随机激光。发现激光阈值随浓度增加,0.1重量%的激光阈值为$75.8 \pm 9.4$ MW/cm $^2$,0.5重量%的激光阈值为$121.1 \pm 2.1$ MW/cm $^2$,发现两种浓度的线宽均为$\approx 10$ nm。我们还考虑了材料的光稳定性,并发现它显示完全可逆的光降解与光稳定性和恢复率大于先前观察到的DO 11/PMMA没有NP。这种光稳定性和恢复率的增强被认为是由修改后的相关发色团域模型,与纳米粒子导致的域自由能优势从0.29 eV增加到0.41 eV的解释。此外,发现分子衰减和恢复速率与先前DO 11/PMMA的测量结果一致[Polymer Chemistry \textbf{4},4948(2013)]。这些结果提出了新的途径,鲁棒抗光降解的有机染料为基础的光学器件的发展。

英文摘要:

We report the observation of intensity feedback random lasing at 645 nm in Disperse Orange 11 dye-doped PMMA (DO11/PMMA) with dispersed ZrO$_2$ nanoparticles (NPs). The lasing threshold is found to increase with concentration, with the lasing threshold for 0.1 wt\% being $75.8 \pm 9.4$ MW/cm$^2$ and the lasing threshold for 0.5 wt\% being $121.1 \pm 2.1$ MW/cm$^2$, with the linewidth for both concentrations found to be $\approx 10$ nm. We also consider the material's photostability and find that it displays fully reversible photodegradation with the photostability and recovery rate being greater than previously observed for DO11/PMMA without NPs. This enhancement in photostability and recovery rate is found to be explicable by the modified correlated chromophore domain model, with the NPs resulting in the domain free energy advantage increasing from 0.29 eV to 0.41 eV. Additionally, the molecular decay and recovery rates are found to be in agreement with previous measurements of DO11/PMMA [Polymer Chemistry \textbf{4}, 4948 (2013)]. These results present new avenues for the development of robust photodegradation-resistant organic dye-based optical devices.

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