非硅化物形成杂质共沉积下硅表面的离子束纳米图案化
Ion-beam nanopatterning of silicon surfaces under co-deposition of non-silicide-forming impurities
摘要：
我们报告的实验表面纳米图案的Si目标的照射与2 keV的Ar +离子撞击在近掠入射，同时共沉积的Au杂质同时提取的金目标由相同的离子束。许多研究小组最近的实验表明，在金属杂质存在的情况下，硅化物的形成是斑图形成的先决条件。尽管已知Au不会与Si原子形成稳定的化合物，但在我们的实验中仍然出现了纳米波长和小振幅的波纹，并且其方向随着与Au源的距离而变化。我们通过俄歇电子和能量色散X射线光谱提供样品分析结果，用于空间分辨化学成分，并通过原子力，扫描透射电子和高分辨率透射显微镜提供其形态学特性。我们讨论了这些发现，在目前的连续模型，这类系统。的组合物和动态内的近表面的非晶化层，englomerate预计将发挥相关的作用，占这些表面结构的意外形成。
英文摘要：
We report experiments on surface nanopatterning of Si targets which are irradiated with 2 keV Ar + ions impinging at near-glancing incidence, under concurrent co-deposition of Au impurities simultaneously extracted from a gold target by the same ion beam. Previous recent experiments by a number of groups suggest that silicide formation is a prerequisite for pattern formation in the presence of metallic impurities. In spite of the fact that Au is known not to form stable compounds with the Si atoms, ripples nonetheless emerge in our experiments with nanometric wavelengths and small amplitudes, and with an orientation that changes with distance to the Au source. We provide results of sample analysis through Auger electron and energy-dispersive X-ray spectroscopies for their space-resolved chemical composition, and through atomic force, scanning transmission electron, and high-resolution transmission microscopies for their morphological properties. We discuss these findings in the light of current continuum models for this class of systems. The composition of and the dynamics within the near-surface amorphized layer that ensues is expected to play a relevant role to account for the unexpected formation of these surface structures.
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