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arXiv 1509.04769astro-ph.IM
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用MPES程序表面形貌和X射线散射分析X射线天文多层膜反射镜的微观粗糙度演变

Analysis of microroughness evolution in X-ray astronomical multilayer mirrors by surface topography with the MPES program and by X-ray scattering

R. Canestrari, D. Spiga, G. Pareschi

摘要:

未来的硬X射线望远镜(如SIMBOL-X和Constellation-X)将使用多层涂层的硬X射线光学器件,其角分辨率可与软X射线的分辨率相媲美。事实上,X射线光学中的关键点之一是多层界面微观粗糙度,其导致有效面积减小和X射线散射(XRS)。特别是后者,是造成图像质量下降的原因。在多层沉积工艺中,通常观察到由于基底轮廓复制和固有的随机沉积噪声而导致的界面平滑度劣化。因此,应通过表面形貌分析、X射线反射率和XRS测量来仔细研究粗糙度的增长。这是方便的表示粗糙度的演变方面的接口功率谱密度(PSD),这是直接相关的XRS,反过来,在影响光学HEW(半能量宽度)。为了解释粗糙度放大,并帮助我们预测硬X射线光学成像性能,我们已经实现了一个众所周知的动力学连续方程模型在IDL语言程序(MPES,多层PSD演化模拟器),使我们能够确定的特征生长参数在多层膜。在本文中,我们提出了一些分析的结果,我们进行了几个样品与硬X射线多层膜(W/Si,Pt/C,Mo/Si)使用不同的沉积技术。我们还显示了从所获得的建模产生的XRS预测,在8.05千电子伏的能量进行的实验XRS测量相比。

英文摘要:

Future hard X-ray telescopes (e.g. SIMBOL-X and Constellation-X) will make use of hard X-ray optics with multilayer coatings, with angular resolutions comparable to the achieved ones in the soft X-rays. One of the crucial points in X-ray optics, indeed, is multilayer interfacial microroughness that causes effective area reduction and X-Ray Scattering (XRS). The latter, in particular, is responsible for image quality degradation. Interfacial smoothness deterioration in multilayer deposition processes is commonly observed as a result of substrate profile replication and intrinsic random deposition noise. For this reason, roughness growth should be carefully investigated by surface topographic analysis, X-ray reflectivity and XRS measurements. It is convenient to express the roughness evolution in terms of interface Power Spectral Densities (PSD), that are directly related to XRS and, in turn, in affecting the optic HEW (Half Energy Width). In order to interpret roughness amplification and to help us to predict the imaging performance of hard X-ray optics, we have implemented a well known kinetic continuum equation model in a IDL language program (MPES, Multilayer PSDs Evolution Simulator), allowing us the determination of characteristic growth parameters in multilayer coatings. In this paper we present some results from analysis we performed on several samples coated with hard X-ray multilayers (W/Si, Pt/C, Mo/Si) using different deposition techniques. We show also the XRS predictions resulting from the obtained modelizations, in comparison to the experimental XRS measurements performed at the energy of 8.05 keV.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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