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arXiv 1509.00516cond-mat.mtrl-sciphysics.atom-ph
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二维双层硅薄膜的应变诱导能带隙开放

Strain-induced energy band gap opening in two-dimensional bilayered silicon film

Zhonghang Ji, Ruiping Zhou, Lok C. Lew Yan Voon, Yan Zhuang

摘要:

本文采用密度泛函理论研究了双层硅薄膜在面内双轴应变/应力作用下的结构和电子性质。采用局域密度近似和广义梯度近似对二维硅薄膜的原子结构进行了优化。在没有应变/应力的情况下,双层硅膜的五个屈曲的六边形蜂窝结构已被获得为局部能量极小值,并验证了它们的结构稳定性。这些结构呈现出一个Dirac-cone形的能带图,带隙为零。施加双向拉伸应变导致屈曲高度的降低。在临界双轴应变下,观察到了具有零屈曲高度的原子平坦结构。应变在10.7% ~ 15.4%范围内增加,导致带隙开放,当应变为14.3%时,最大带隙开放为~ 168.0meV。计算了其能带图、电子传输效率和电荷输运性质。

英文摘要:

This work presents a theoretical study of the structural and electronic properties of bilayered silicon films under in-plane biaxial strain/stress using density functional theory. Atomic structures of the two-dimensional silicon films are optimized by using both the local-density approximation and generalized gradient approximation. In the absence of strain/stress, five buckled hexagonal honeycomb structures of the bilayered silicon film have been obtained as local energy minima and their structural stability has been verified. These structures present a Dirac-cone shaped energy band diagram with zero energy band gaps. Applying tensile biaxial strain leads to a reduction of the buckling height. Atomically flat structures with zero bucking height have been observed when the AA-stacking structures are under a critical biaxial strain. Increase of the strain between 10.7% ~ 15.4% results in a band-gap opening with a maximum energy band gap opening of ~168.0 meV obtained when 14.3% strain is applied. Energy band diagram, electron transmission efficiency, and the charge transport property are calculated.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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