光学表面的RF等离子体清洗：不同碳同素异形体上清洗速率随RF功率和距离变化的研究
RF plasma cleaning of optical surfaces: A study of cleaning rates on different carbon allotropes as a function of RF powers and distances
摘要：
本文报道了一种利用远程感应耦合低压射频等离子体源（GV 10 x下游灰化器）对大型光学表面上的碳污染物进行清洁的先进方法的扩展研究。分析了这种放大清洗工艺的技术和科学特征，如不同碳同素异形体（无定形和类金刚石碳）的清洗效率与原料气体成分、RF功率（范围从30到300 W）和源-物距（415到840 mm）的关系。这些功能依赖的基本物理现象进行了讨论。
英文摘要：
An extended study on an advanced method for the cleaning of carbon contaminations on large optical surfaces using a remote inductively coupled low pressure RF plasma source (GV10x downstream asher) is reported in this work. Technical as well as scientific features of this scaled up cleaning process are analyzed, such as the cleaning efficiency for different carbon allotropes (amorphous and diamond-like carbon) as a function of feedstock gas composition, RF power (ranging from 30 to 300W), and source-object distances (415 to 840 mm). The underlying physical phenomena for these functional dependences are discussed.
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