位模式磁纪录写入器几何形状的数值优化
Numerical optimization of writer geometries for bit patterned magnetic recording
摘要：
提出了一种全自动的极尖形状优化工具，包括磁头几何结构、网格划分、微磁模拟和评价。针对面密度为2.12 Tdots/in $^2$的底层位图案化介质，对三种不同的写入方案（居中、交错和叠瓦）进行了优化。对厚度为10 nm、磁间距为8 nm的单相介质进行了优化。从计算的写入场及其梯度和在相邻轨道上的岛的写入期间的最小能量势垒，计算总写入错误率。对于居中写入、交错写入和叠瓦式写入，总体写入误差分别为0.7、0.08和2.8 x 10 $^{-5}$。
英文摘要：
A fully-automated pole-tip shape optimization tool, involving write head geometry construction, meshing, micromagnetic simulation and evaluation, is presented. Optimizations have been performed for three different writing schemes (centered, staggered and shingled) for an underlying bit patterned media with an areal density of 2.12 Tdots/in$^2$ . Optimizations were performed for a single-phase media with 10 nm thickness and a mag spacing of 8 nm. From the computed write field and its gradient and the minimum energy barrier during writing for islands on the adjacent track, the overall write error rate is computed. The overall write errors are 0.7, 0.08, and 2.8 x 10$^{-5}$ for centered writing, staggered writing, and shingled writing.
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